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<identifier>oai:HAL:hal-00475542v1</identifier>
<datestamp>2018-01-11</datestamp>
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<setSpec>subject:phys</setSpec>
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<setSpec>collection:AGROPOLIS</setSpec>
<setSpec>collection:INSU</setSpec>
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<metadata><dc>
<publisher>HAL CCSD</publisher>
<title lang=en>Electron Probe Microanalysis of Thin Films and Multilayers Using the Computer Program XFILM</title>
<creator>Llovet, Xavier</creator>
<creator>Merlet, Claude</creator>
<contributor>Serveis Cientificotècnics, Universitat de Barcelona ; Université du Québec</contributor>
<contributor>Géosciences Montpellier ; Université des Antilles et de la Guyane (UAG) - Institut national des sciences de l'Univers (INSU - CNRS) - Université de Montpellier (UM) - Centre National de la Recherche Scientifique (CNRS)</contributor>
<description>International audience</description>
<source>ISSN: 1431-9276</source>
<source>EISSN: 1435-8115</source>
<source>Microscopy and Microanalysis</source>
<publisher>Cambridge University Press (CUP)</publisher>
<identifier>hal-00475542</identifier>
<identifier>https://hal.archives-ouvertes.fr/hal-00475542</identifier>
<source>https://hal.archives-ouvertes.fr/hal-00475542</source>
<source>Microscopy and Microanalysis, Cambridge University Press (CUP), 2010, 16, pp.21-32. 〈10.1017/S1431927609991218〉</source>
<identifier>DOI : 10.1017/S1431927609991218</identifier>
<relation>info:eu-repo/semantics/altIdentifier/doi/10.1017/S1431927609991218</relation>
<language>en</language>
<subject lang=en>EPMA</subject>
<subject lang=en>thin-film analysis</subject>
<subject lang=en>X-ray emission</subject>
<subject lang=en>thickness determination</subject>
<subject>[PHYS.PHYS.PHYS-GEN-PH] Physics [physics]/Physics [physics]/General Physics [physics.gen-ph]</subject>
<type>info:eu-repo/semantics/article</type>
<type>Journal articles</type>
<description lang=en>XFILM is a computer program for determining the thickness and composition of thin films on Substrates and multilayers by electron probe microanalysis. In this study, we describe the X-ray emission model implemented in the latest version of XFILM and assess its reliability by comparing measured and calculated k-ratios from thin-film samples available in the literature. We present and discuss examples of applications of XFILM that illustrate the capabilities of the program.</description>
<date>2010</date>
</dc>
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