Éditeur(s) : HAL CCSD Cambridge University Press (CUP)
Résumé : International audience
XFILM is a computer program for determining the thickness and composition of thin films on Substrates and multilayers by electron probe microanalysis. In this study, we describe the X-ray emission model implemented in the latest version of XFILM and assess its reliability by comparing measured and calculated k-ratios from thin-film samples available in the literature. We present and discuss examples of applications of XFILM that illustrate the capabilities of the program.
ISSN: 1431-9276

hal-00475542
https://hal.archives-ouvertes.fr/hal-00475542
DOI : 10.1017/S1431927609991218